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Products
Vacuum System & Technology
Vacuum Deposition Systems
它是一种在真空状态下利用电阻热、 beam, plasma 使金属和非金属材料呈气态并沉积在基片上的设备，主要用于显示器、半导体和太阳能制造。真空室中采用各种Heating Element（Sheath, Super Kantal, Halogen, Graphite），并提供高真空环境。
E-beam Evaporation System
· Single/Multi Pocket E-Beam source with Water Cooled Crucible (4 cc up to 75 cc) with individual shutter
· High Voltage Power Supply (3 kW to 15 kW)
· X-Y Beam Sweep & Controller
· 4" Diameter View Port on Front Door With Manual Shutter
DC Magnetron Sputter
· Available in single & multi sputter sources with water cooling system.
· Available in high voltage power supply (3 kW ~ 10 kW)
· Substrate Rotation & Heating (100 ℃ up to 400 ℃)
· Source size from 3" to 8", User defined source size available.
Vacuum Furnace
· Working Temperature : 500 ℃ ~ 2,300 ℃
· Working Zone : 300 mm3 ~ 500 mm3
· Chamber Shape : cylindrical, rectangular, spherical
· Heater : sheath, super kantal, halogen, graphite
· Atmosphere : vacuum, ar
· Auto Vent & Radiation Thermometer
Customized Vacuum & Components
IVT 为韩国的大学和研究机构提供了各种真空系统，以满足定制设计要求和特点。
Cylindrical UHV chamber
