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- TDS
- etc
TDS
dTDS (Thermal Desorption Spectroscopy for Display Material)
TDS for display purposes is designed to analyze organic thin films on glass materials, with flexible sample holding and loading depending on the shape.
Specification
· Sample Description : glasses up to 100 mm × 100 mm
· Mass Range : (1 ~ 200) amu
· IR Rod Heating : up to 900 ℃
· Base Pressure : *process chamber, < 5 × 10-7 mbar / *measurement chamber, < 1 × 10-9 mbar
· DAQ System : manual or automated fully, sampleloading to measurement through data analysis
aTDS (Automated TDS for Semiconductor Wafer)
aTDS, designed for the analysis of 300mm wafers, is part of an automated system that includes EFEM and a Wafer Transfer Robot. It can be provided with a variety of core components, including QMS options of 100, 200, 300, 500 amu, according to user requirements.
Specification
· Sample Size : 300 mm WAFER
· Halogen Lamp Heater
· up to 950℃
· High Vacuum with gold plated chamber
· Fully Automatic (EFEM/Aligner/WTR)
TDS(Thermal Desorption Spectroscopy for Special Application)
Additionally, specialized TDS equipment is manufactured for specific purposes, offering qualitative and quantitative analysis certificates upon request from external organizations.
- Complex TDS
- SRM in distance, sample in large chamber TDS
- Varied sample features, user specified TDS in demand
User defined TDS Specification
· Sample Description : up to Ø30 mm × 50 mm
· Mass Range : (1 ~ 200) amu
· IR Rod Heating : up to 900 ℃
· Base Pressure : *process chamber, < 2 × 10-9 mbar / *measurement chamber, < 1 × 10-9 mbar
· DAQ System : manual, sample loading to measurement through data analysis
· System Design : user specified requirements
Complex TDS Specification
· Sample Description : up to Ø20 mm × 50 mm
· Mass Range : (1 ~ 200) amu
· IR Rod Heating : up to 800 ℃
· Base Pressure : *process chamber, < 5 × 10-8 mbar
· DAQ System : manual, sample loading to measurement through data analysis
