Vacuum Deposition Systems

This equipment, used in vacuum conditions, utilizes resistance heating, electron beams, and plasma to convert metal and non-metal materials into a gaseous state for deposition on substrates, widely used in the manufacturing of displays, semiconductors, and solar panels. It offers a variety of heating elements (Sheath, Super Kanthal, Halogen, Graphite) and a high vacuum environment within the vacuum chamber.

E-beam Evaporation System

· Single/Multi Pocket E-Beam source with Water Cooled Crucible (4 cc up to 75 cc) with individual shutter
· High Voltage Power Supply (3 kW to 15 kW)
· X-Y Beam Sweep & Controller
· 4" Diameter View Port on Front Door With Manual Shutter

DC Magnetron Sputter

· Available in single & multi sputter sources with water cooling system.
· Available in high voltage power supply (3 kW ~ 10 kW)
· Substrate Rotation & Heating (100 ℃ up to 400 ℃)
· Source size from 3" to 8", User defined source size available.

Vacuum Furnace

· Working Temperature : 500 ℃ ~ 2,300 ℃
· Working Zone : 300 mm3 ~ 500 mm3
· Chamber Shape : cylindrical, rectangular, spherical
· Heater : sheath, super kantal, halogen, graphite
· Atmosphere : vacuum, ar
· Auto Vent & Radiation Thermometer

Customized Vacuum & Components

IVT has been supplying various vacuum-based systems to domestic universities and research institutions, tailored to the design requirements and characteristics of users.

Cylindrical UHV chamber