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Vacuum Deposition Systems

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Vacuum Deposition Systems

진공 상태에서 저항 열, 전자 beam, plasma를 이용하여 금속 및 비금속 물질을 기체 상태로 만들어 기판에 증착 시키는 장비이며, 주로 디스플레이, 반도체, 태양광 제조에 많이 쓰이고 있습니다. 진공 챔버 내에 다양한 Heating Element(Sheath, Super Kantal, Halogen, Graphite)의 적용 및 고진공 환경을 제공합니다.

  • E-beam Evaporation System

  • ·Single/Multi Pocket E-Beam source with Water
    Cooled Crucible(4 cc up to 75cc) with individual shutter
  • ·High Voltage Power Supply(3kW to 15kW)
  • ·X-Y Beam Sweep & Controller
  • ·4” Diameter View Port on Front Door With Manual Shutter
  • DC Magnetron Sputter

  • ·Available in single & multi sputter sources with
    water cooling system.
  • ·Available in high voltage power supply
    (3kw ~ 10kw)
  • ·Substrate Rotation & Heating(100℃ up to 400℃)
  • ·Source size from 3"to 8", User defined source
    size available.
  • E-beam Evaporation System

  • ·Single/Multi Pocket E-Beam source with Water
    Cooled Crucible(4 cc up to 75cc) with individual shutter
  • ·High Voltage Power Supply(3kW to 15kW)
  • ·X-Y Beam Sweep & Controller
  • ·4” Diameter View Port on Front Door With Manual Shutter
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