Vacuum Deposition Systems
진공 상태에서 저항 열, 전자 beam, plasma를 이용하여 금속 및 비금속 물질을 기체 상태로 만들어 기판에 증착 시키는 장비이며, 주로 디스플레이, 반도체, 태양광 제조에 많이 쓰이고 있습니다.
진공 챔버 내에 다양한 Heating Element(Sheath, Super Kantal, Halogen, Graphite)의 적용 및 고진공 환경을 제공합니다.
E-beam Evaporation System
- · Single/Multi Pocket E-Beam source with Water Cooled Crucible
(4 cc up to 75 cc) with individual shutter
- · High Voltage Power Supply (3 kW to 15 kW)
- · X-Y Beam Sweep & Controller
- · 4" Diameter View Port on Front Door With Manual Shutter
DC Magnetron Sputter
- · Available in single & multi sputter sources with water
cooling system.
- · Available in high voltage power supply (3 kW ~ 10 kW)
- · Substrate Rotation & Heating (100 ℃ up to 400 ℃)
- · Source size from 3" to 8", User defined source
size available.
Vacuum Furnace
- · Working Temperature : 500 ℃ ~ 2,300 ℃
- · Working Zone : 300 mm3 ~ 500 mm3
- · Chamber Shape : cylinderical, rectangular, spherical
- · Heater : sheath, super kantal, halogen, graphite
- · Atmosphere : vacuum, ar
- · Auto Vent & Radiation Thermometer
