WCS (Wafer Contamination Scanner)
Powerful, fully automated wafer metal-contaminant detection System.
Developed in collaboration with a major semiconductor Company
Key characteristics include the following
- ·Fully automated and equipped with EFEM, automatic
- calibration for quantitative analysis
- ·Patented scanning nozzle works on various wafer surfaces
- including hydrophobic and hydrophilic surfaces, patterned
- wafer and glasses.
- ·chemical supply system that autimatical residue removal,
- which improves safety.
- ·Flexible scan mode (i.e. full, radial, sector, chip mapping)
- and can be customized
- ·Higher etching speed from its improved nebulizer and spraying knife