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Vacuum Deposition Systems

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Vacuum Deposition Systems

The system gasifies metal or non-metal materials and deposits the gas on printed circuit boards by using the resistant heat, electronic beam and plasma in a vacuum state. These systems are mainly used for the productions of displays, semiconductors and solar panels. Various heating elements (Sheath, Super Kantal, Halogen, Graphite) are applied in the vacuum chamber, and a high vacuum environment is providd.

  • E-beam Evaporation System

  • ·Single/Multi Pocket E-Beam source with Water
    Cooled Crucible(4 cc up to 75cc) with individual shutter
  • ·High Voltage Power Supply(3kW to 15kW)
  • ·X-Y Beam Sweep & Controller
  • ·4” Diameter View Port on Front Door With Manual Shutter
  • DC Magnetron Sputter

  • ·Available in single & multi sputter sources with
    water cooling system.
  • ·Available in high voltage power supply
    (3kw ~ 10kw)
  • ·Substrate Rotation & Heating(100℃ up to 400℃)
  • ·Source size from 3"to 8", User defined source
    size available.
  • E-beam Evaporation System

  • ·Single/Multi Pocket E-Beam source with Water
    Cooled Crucible(4 cc up to 75cc) with individual shutter
  • ·High Voltage Power Supply(3kW to 15kW)
  • ·X-Y Beam Sweep & Controller
  • ·4” Diameter View Port on Front Door With Manual Shutter
IVT